Blank Cover Image

Extra Low-Temperature SiO2 Deposition Using Aminosilanes

著者名:
掲載資料名:
Atomic layer deposition applications 2
シリーズ名:
ECS transactions
シリーズ巻号:
3(15)
発行年:
2007
開始ページ:
119
終了ページ:
128
総ページ数:
10
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
19385862
ISBN:
9781566775427 [1566775426]
言語:
英語
請求記号:
E23400/3-15
資料種別:
国際会議録

類似資料:

1 国際会議録 Evaluation of Trisilylamine for HfSiO x Atomic Layer Deposition

C. Dussarrat, I. Suzuki, K. Yanagita

Electrochemical Society
7 国際会議録 Low Temperature Copper Deposition by PE-ALD.

Jiajun Mao, Eric Eisenbraun, Vincent Omarjee, Clement Lanslot, Christian Dussarrat

Materials Research Society
2 国際会議録 Low Pressure Chemical Vapor Deposition of Tantalum-Based Material

K. Tanagita, C. Dussarrat, L. Beyssac

Electrochemical Society
8 国際会議録 Grain Formation in Polycrystalline Silicon Films Deposition on SiO2 at Very Low Temperatures

Wang, K.-C., Wang, R.-Y., Yew, T.-R., Loferski, J. J., Hwang, H.-L.

MRS - Materials Research Society
3 国際会議録 42 High Purity hidium Thin Films Depositions Using the Inorganic IrF6

Dussarrat, C., Gatineau, J.

Electrochemical Society
9 国際会議録 Ti Source Precursors for Atomic Layer Deposition of TiO2, STO and BST

R. Katamreddy, V. Omarjee, B. Feist, C. Dussarrat

Electrochemical Society
4 国際会議録 Low Pressure Chemical Vapor Deposition of Silicon Nitride Using Mono- and Disilylamine

Dussarrat, C., Girard, J.-M., Kimura, T., Tamaoki, N., Sato, Y.

Electrochemical Society
10 国際会議録 Low Temperature SiO2 Etching

Sato, M., Sugimoto, K., Adachi, K., Takehara, D., Uda, K., Sakiyama, K.

Electrochemical Society
5 国際会議録 Low-Temperature Solution for Silicon Nitride LPCVD Using Cl-Free Inorganic Trisilylamine

Tamaoki, N., Sato, Y., Dussarrat, C., Girard, J.-M., Kimura, T.

Electrochemical Society
11 国際会議録 Growth of Transparent SiO2 Thin Film on Silicon at Room Temperature by Using 172 nm Xe2 Excimer Lamp

Suzuki, T., Murahara, M.

MRS - Materials Research Society
6 国際会議録 To Assess the Characterization of SiO2 Films for HgCdTe Surface Passivation Using a Novel Low Temperature Liquid Phase Deposition

Houng, M.P., Wang, Y.H., Wang, N.F., Huang, C.J.

Electrochemical Society
12 国際会議録 A LOW-TEMPERATURE PROCESS FOR DEVICE QUALITY Si/SiO2 INTERFACES ON Si(111)

Yasuda, T., Lee, D. R., Bjorkman, C. H., Ma, Y., Lucovsky, G., Emmerichs, U., Meyer, C., Leo, K., Kurz, H.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12