Model and simulation for testing two-mirror optical system by subaperture stitching interferometry

Model and simulation for testing two-mirror optical system by subaperture stitching interferometry

著者名:

L. Wang ( Institute of Optics and Electronics, China )
S. Wu ( Institute of Optics and Electronics, China )
X. Hou ( Institute of Optics and Electronics, China )
L. Kuang ( Institute of Optics and Electronics, China )
X. Cao ( Institute of Optics and Electronics, China )

掲載資料名:

4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7283

発行年:

2009

巻:

1

開始ページ:

72830Y-1

終了ページ:

72830Y-4

総ページ数:

4

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819475435 [0819475432]

言語:

英語

請求記号:

P63600/7283

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052804
シリーズID:	PA00000029
会議名:	International Symposium on Advanced Optical Manufacturing and Testing Technologies
回次:	2008 : 4th
会議開催地:	Chengdu, China
会議開催年:	2008.11.19-2008.11.21
論文注記:	4th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 19-21 November 2008, Chengdu, China - Poster Session, 72830Y, 7283-33

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