Transparent conductive titanium-doped indium oxide films prepared by direct current magnetron sputtering

Transparent conductive titanium-doped indium oxide films prepared by direct current magnetron sputtering

著者名:

L. Lin ( Fujian Normal Univ., China )
F. Lai ( Fujian Normal Univ., China )
Y. Qu ( Fujian Normal Univ., China )
R. Gai ( Fujian Normal Univ., China )

掲載資料名:

4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7282

発行年:

2009

巻:

1

開始ページ:

72821C-1

終了ページ:

72821C-5

総ページ数:

5

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819475428 [0819475424]

言語:

英語

請求記号:

P63600/7282

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052803
シリーズID:	PA00000029
会議名:	International Symposium on Advanced Optical Manufacturing and Testing Technologies
回次:	2008 : 4th
会議開催地:	Chengdu, China
会議開催年:	2008.11.19-2008.11.21
論文注記:	4th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 19-21 November 2008, Chengdu, China - Poster Session, 72821C, 7282-47

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