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Development of thick film PECVD amorphous silicon with low stress for MEMS applications

著者名:
  • B. Chen ( Institute of Bioengineering and Nanotechnology, Singapore )
  • F. E. H. Tay ( Institute of Bioengineering and Nanotechnology, Singapore )
  • C. Iliescu ( Institute of Bioengineering and Nanotechnology, Singapore )
掲載資料名:
Micro- and nanotechnology : materials, processes, packaging, and systems IV : 10-12 December 2008, Melbourne, Australia
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
7269
発行年:
2008
開始ページ:
72690M-1
終了ページ:
72690M-11
総ページ数:
11
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819475213 [0819475211]
言語:
英語
請求記号:
P63600/7269
資料種別:
国際会議録

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