Measurement of photoelectrons decay in doping AgCl by microwave absorption phase-sensitive technique

Measurement of photoelectrons decay in doping AgCl by microwave absorption phase-sensitive technique

著者名:

X. Dai ( Hebei Univ., China )
G. Dong ( Hebei Univ., China )
H. Liu ( Hebei Univ., China )
X. Li ( Hebei Univ., China )
S. Yang ( Hebei Univ., China )

掲載資料名:

Optoelectronic measurement technology and applications : 2008 International Conference on Optical Instruments and Technology : 16-19 November 2008, Beijing, China

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7160

発行年:

2009

開始ページ:

71601P-1

終了ページ:

71601P-8

総ページ数:

8

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819474049 [0819474045]

言語:

英語

請求記号:

P63600/7160

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052791
シリーズID:	PA00000029
会議名:	International Conference on Optical Instruments and Technology
回次:	2008
会議開催地:	Beijing, China
会議開催年:	2008.11.16-2008.11.19
論文注記:	2008 International Conference on Optical Instruments and Technology, 16-19 November 2008, Beijing, China - Poster Session, 71601P, 7160-37

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