Model based pattern matching

Model based pattern matching

著者名:

L. S. Melvin III ( Synopsys, Inc., United States )
J. Tuttle ( Synopsys, Inc., United States )
M. Boman ( Synopsys, Inc., United States )

掲載資料名:

Lithography Asia 2008

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7140

発行年:

2008

巻:

2

開始ページ:

71402B-1

終了ページ:

71402B-8

総ページ数:

8

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473813 [0819473812]

言語:

英語

請求記号:

P63600/7140

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052771
シリーズID:	PA00000029
会議名:	Lithography Asia
回次:	2008
会議開催地:	Taipei, Taiwan
会議開催年:	2008.11.04-2008.11.06
論文注記:	Lithography Asia 2008, 4-6 November 2008, Taipei, Taiwan - Optical (OPC), 71402B, 7140-82

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1 国際会議録 Model-based methodology for reducing OPC output pattern complexity Melvin, L.S., III, Rieger, M.L. SPIE - The International Society of Optical Engineering	7 国際会議録 Model-based placement and optimization of subresolution assist features [6154-86] Barnes, L. D., Painter, B. D., Melvin III, L. S. SPIE - The International Society of Optical Engineering
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3 国際会議録 Placing assist features in layout using a process model Melvin III, L. S., Shiely, J. P., Rieger, M. L. SPIE - The International Society of Optical Engineering	9 国際会議録 32nm half pitch node OPC process model development for three dimensional mask effects using rigorous simulation L. S. Melvin III, T. Schmoeller, J. Li Society of Photo-optical Instrumentation Engineers
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5 国際会議録 Model-based interpretation filtering for complex two-dimensional layout features Melvin, L.S., III, Shiely, J.P., Cork, C.M., Rieger, M.L. SPIE - The International Society of Optical Engineering	11 国際会議録 A discussion of the regression of physical parameters for photolithographic process models L. S. Melvin III, K. D. Lucas SPIE - The International Society of Optical Engineering
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