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CD uniformity improvement for 3x nm node devices

著者名:
  • C.-M. Park ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • H.-B. Kim ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • H.-D. Kim ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • H.-W. Kim ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • C.-H. Kim ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
掲載資料名:
Lithography Asia 2008
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
7140
発行年:
2008
巻:
2
開始ページ:
714024-1
終了ページ:
714024-9
総ページ数:
9
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
言語:
英語
請求記号:
P63600/7140
資料種別:
国際会議録

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