Mask specification guidelines in spacer patterning technology
- 著者名:
- K. Hashimoto ( Toshiba Corp., Japan )
- H. Mukai ( Toshiba Corp., Japan )
- S. Miyoshi ( Toshiba Corp., Japan )
- S. Yamaguchi ( Toshiba Corp., Japan )
- H. Mashita ( Toshiba Corp., Japan )
- 掲載資料名:
- Lithography Asia 2008
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 7140
- 発行年:
- 2008
- 巻:
- 2
- 開始ページ:
- 714022-1
- 終了ページ:
- 714022-10
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819473813 [0819473812]
- 言語:
- 英語
- 請求記号:
- P63600/7140
- 資料種別:
- 国際会議録
類似資料:
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
8
国際会議録
Mask pattern quality assurance based on lithography simulation with fine pixel SEM image [5992-59]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
国際会議録
Fine pixel SEM image for mask pattern quality assurance based on lithography simulation [6283-48]
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |