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An innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging

著者名:
  • S. Hsu ( ASML Brion Technologies, Inc., United States )
  • L. Chen ( ASML Brion Technologies, Inc., United States )
  • Z. Li ( ASML Brion Technologies, Inc., United States )
  • S. Park ( ASML Brion Technologies, Inc., United States )
  • K. Gronlund ( ASML Brion Technologies, Inc., United States )
掲載資料名:
Lithography Asia 2008
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
7140
発行年:
2008
巻:
1
開始ページ:
714010-1
終了ページ:
714010-10
総ページ数:
10
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
言語:
英語
請求記号:
P63600/7140
資料種別:
国際会議録

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