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The study of CD behavior due to transmission control position change within photomask substrate

著者名:
  • M. Kim ( Hynix Semiconductor, Inc., South Korea )
  • H. Lee ( Hynix Semiconductor, Inc., South Korea )
  • S. Woo ( Hynix Semiconductor, Inc., South Korea )
  • K. Seo ( Hynix Semiconductor, Inc., South Korea )
  • Y. Choi ( Hynix Semiconductor, Inc., South Korea )
掲載資料名:
Photomask technology 2008
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
7122
発行年:
2008
巻:
2
開始ページ:
712239-1
終了ページ:
712239-7
総ページ数:
7
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473554 [0819473553]
言語:
英語
請求記号:
P63600/7122
資料種別:
国際会議録

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