Spectroscopic ellipsometry applications in photomask technology

Spectroscopic ellipsometry applications in photomask technology

著者名:

R. A. Synowicki ( J. A. Woollam Co., Inc., United States )
J. N. Hilfiker ( J. A. Woollam Co., Inc., United States )

掲載資料名:

Photomask technology 2008

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7122

発行年:

2008

巻:

2

開始ページ:

712231-1

終了ページ:

712231-11

総ページ数:

11

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473554 [0819473553]

言語:

英語

請求記号:

P63600/7122

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052753
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2008 : 28th
会議開催地:	Monterey, California, USA
会議開催年:	2008.10.07-2008.10.10
論文注記:	Photomask technology 2008, 7-10 October 2008, Monterey, California, USA - Session 26. Metrology for Placement and Optical Structure, 712231, 7122-109

類似資料:

1 国際会議録 Spectroscopic Ellipsometry Methods for Thin Absorbing Coatings J.N. Hilfiker, R.A. Synowicki, H.G. Tompkins Society of Vacuum Coaters	7 国際会議録 In-situ monitor and control using fast spectroscopic ellipsometry Woollam,J.A., Gao,X., Heckens,S., Hilfiker,J.N. SPIE-The International Society for Optical Engineering
2 国際会議録 Refractive index measurements of photoresist and antireflective coatings with variable-angle spectroscopic ellipsometry Synowicki,R.A., Hilfiker,J.N., Dammel,R.R., Henderson,C.L. SPIE-The International Society for Optical Engineering	8 国際会議録 Fluoropolyrners for 157-nm lithography:optical properties from VUV absorbance and ellipsometry measurements French,R.H., Wheland,R.C., Jones,D.J., Hilfiker,J.N., Synowicki,R.A., Zumsteg,F.C., Feldman,J., Feiring,A.E. SPIE - The International Society for Optical Engineering
3 国際会議録 Spectroscopic Ellipsometry in Optical Coatings Manufacturing J.N. Hilfiker, J.S. Hale, B.D. Johs, T.E. Tiwald, R.A. Synowicki, C.L. Bungay, J.A. Woollam Society of Vacuum Coaters	9 国際会議録 Variable angle spectroscopic ellipsomefry in the vacuum ultraviolet Woollam,J.A., Hilfiker,J.N., Tiwald,T.E., Bungay,C.L., Synowicki,R.A., Meyer,D.E., Herzinger,C.M., Pfeiffer,G.L., … SPIE-The International Society for Optical Engineering
4 国際会議録 Optical characterization in the vacuum ultraviolet with variable angle spectroscopic ellipsometry:157 nm and below Hilfiker,J.N., Singh,B., Synowicki,R.A., Bungay,C.L. SPIE - The International Society for Optical Engineering	10 国際会議録 Recent developments in spectroscopic ellipsometry for in-situ applications Johs,B.D., Hale,J., Ianno,N.J., Herzinger,C.M., Tiwald,T.E., Woollam,J.A. SPIE-The International Society for Optical Engineering
5 国際会議録 Recent Developments in Spectroscopic Ellipsometry for Materials and Process Control J.N. Hilfiker, B. Johs, J. Hale, C.M. Herzinger, T.E. Tiwald, C.L. Bungay, R.A. Synowicki, G.K. Pribil, J.A. Woollam Society of Vacuum Coaters	11 国際会議録 Application of image-processing software to characterize the photomask key parameters for future technologies Tran,A., Schmidt,M.R., Farnsworth,J.N., Yan,P.-Y. SPIE-The International Society for Optical Engineering
6 国際会議録 Application of spectroscopic ellipsometry to characterization of optical thin films (Invited Paper) Woollam, J.A., Bungay, C.L., Yan, L., Thompson, D.W., Hilfiker, J.N. SPIE-The International Society for Optical Engineering	12 国際会議録 Thin Film Measurements by Spectroscopic Ellipsometry Over an Extended Range Cox, J.N., Hutchinson, J.M., Lee, K.K.D., Sheridan, B., Wong, R., Yang, I.-C.J. Electrochemical Society

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