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DFM viewpoints of cell-level layout assessments and indications for concurrent layout optimization

著者名:
  • C.-M. Fu ( Taiwan Semiconductor Manufacturing Co., Ltd., Taiwan )
  • P.-H. Yeh ( Taiwan Semiconductor Manufacturing Co., Ltd., Taiwan )
  • Y.-K. Cheng ( Taiwan Semiconductor Manufacturing Co., Ltd., Taiwan )
  • S. Klaver ( Takumi Technology Corp., United States )
掲載資料名:
Photomask technology 2008
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
7122
発行年:
2008
巻:
1
開始ページ:
71221Z-1
終了ページ:
71221Z-8
総ページ数:
8
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473554 [0819473553]
言語:
英語
請求記号:
P63600/7122
資料種別:
国際会議録

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