Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO)

Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO)

著者名:

L. Pang ( Luminescent Technologies, Inc., United States )
G. Xiao ( Luminescent Technologies, Inc., United States )
V. Tolani ( Luminescent Technologies, Inc., United States )
P. Hu ( Luminescent Technologies, Inc., United States )
T. Cecil ( Luminescent Technologies, Inc., United States )

掲載資料名:

Photomask technology 2008

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7122

発行年:

2008

巻:

1

開始ページ:

71221W-1

終了ページ:

71221W-14

総ページ数:

14

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473554 [0819473553]

言語:

英語

請求記号:

P63600/7122

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052753
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2008 : 28th
会議開催地:	Monterey, California, USA
会議開催年:	2008.10.07-2008.10.10
論文注記:	Photomask technology 2008, 7-10 October 2008, Monterey, California, USA - Session 15. Simulation and Modeling II, 71221W, 7122-68

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