AIMS-45 image validation of contact hole patterns affer inverse lithography at NA 1.35

AIMS-45 image validation of contact hole patterns affer inverse lithography at NA 1.35

著者名:

E. Hendrickx ( IMEC, Belgium )
R. Birkner ( Mentor Graphics Corp., United States )
M. Kempsell ( Carl Zeiss SMS, Germany )
A. Tritchkov ( Carl Zeiss SMS, Germany )
G. Vandenberghe ( IMEC, Belgium )

掲載資料名:

Photomask technology 2008

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7122

発行年:

2008

巻:

1

開始ページ:

71221E-1

終了ページ:

71221E-11

総ページ数:

11

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473554 [0819473553]

言語:

英語

請求記号:

P63600/7122

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052753
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2008 : 28th
会議開催地:	Monterey, California, USA
会議開催年:	2008.10.07-2008.10.10
論文注記:	Photomask technology 2008, 7-10 October 2008, Monterey, California, USA - Session 10. Wafer Plane Inspection, 71221E, 7122-49

類似資料:

1 国際会議録 Hyper-NA imaging of 45nm node random CH layouts using inverse lithography E. Hendrickx, A. Tritchkov, K. Sakajiri, Y. Granik, M. Kempsell Society of Photo-optical Instrumentation Engineers	7 国際会議録 Through-pitch low-k1 contact hole imaging with CPL technology Wiaux, V., Bekaert, J., Chen, J.F., Hsu, S.D., Ronse, K.G., Socha, R.J., Vandenberghe, G., Van Den Broeke, D.J. SPIE - The International Society of Optical Engineering
2 国際会議録 60nm half pitch contact layer printing: exploring the limits at 1.35NA lithography J. Bekaert, E. Hendrickx, G. Vandenberghe Society of Photo-optical Instrumentation Engineers	8 国際会議録 Mask enhancer technology for 45-nm node contact hole fabrication Yuito, T., Wiaux, V., Look, L. Van, Vandenberghe, G., Irie, S., Matsuo, T., Misaka, A., Watanabe, H., Sasago, M. SPIE - The International Society of Optical Engineering
3 国際会議録 Using the AIMS 45-193i for hyper-NA imaging applications P. De Bisschop, V. Philipsen, R. Birkner, U. Buttgereit, R. Richter Society of Photo-optical Instrumentation Engineers	9 国際会議録 Programmed defects study on masks for 45nm immersion lithography using the novel AIMS 45-193i T. Scheruebl, A. C. Duerr, K. Boehm, R. Birkner, R. Richter, U. Stroessner SPIE - The International Society of Optical Engineering
4 国際会議録 BARC technology for 1.35 NA lithography M. Reilly, G. G. Zhang, K. Spizuoco Society of Photo-optical Instrumentation Engineers	10 国際会議録 Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination [6154-60] Chen, T., Van Den Broeke D, Hsu, S, Park S, Berger G, Coskun T, De Vocht J, Corcoran N, Chen F, Van der Heijden, Finders … SPIE - The International Society of Optical Engineering
5 国際会議録 Simulation of dense contact hole (K1=O.35) arrays with 193-nm immersion lithography [6154-106] Raub, A. K., Biswas, A. M, Borodovsky, Y., Allen, G., Brueck, S. R. J. SPIE - The International Society of Optical Engineering	11 国際会議録 Optical extensions towards the 45-nm node Hendrickx, E., Monnoyer, P., Van Look, L., Vandenberghe, G. SPIE - The International Society of Optical Engineering
6 国際会議録 Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75] Park, J., Hsu, S., Van Den Broeke, D., Chen, J. F., Dusa, M., Socha, R., Finders, J., Vleeming, B., van Oosten, A., … SPIE - The International Society of Optical Engineering	12 国際会議録 Early learning on hyper-NA lithography using two-beam immersion interference [6154-70] Hendrickx, E., Op de Beeck, M., Gronheid, R., Versluijs, J., Van Look, L., Ercken, M., Vandenberghe, G. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12