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Optimal mask characterization by Surrogate Wafer Print (SWaP) method

著者名:
  • K. R. Kimmel ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
  • I. Hoellein ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
  • J. H. Peters ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
  • P. Ackmann ( Advanced Micro Devices, Inc., United States )
  • B. Connolly ( Toppan Photomasks, Inc., Germany )
掲載資料名:
Photomask technology 2008
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
7122
発行年:
2008
巻:
1
開始ページ:
712219-1
終了ページ:
712219-10
総ページ数:
10
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473554 [0819473553]
言語:
英語
請求記号:
P63600/7122
資料種別:
国際会議録

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