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Crystal growth printability in an advanced foundry FAB: a correlation study between STARlight and ultra broadband BrightField inspection technologies

著者名:
  • T. H. Ng ( Chartered Semiconductor Manufacturing, Ltd., Singapore )
  • M. F. bin Rahmat ( Chartered Semiconductor Manufacturing, Ltd., Singapore )
  • B. Saville ( KLA-Tencor Corp., United States )
  • P. Pak ( KLA-Tencor Corp., United States )
  • W. Chia ( KLA-Tencor Corp., United States )
掲載資料名:
Photomask technology 2008
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
7122
発行年:
2008
巻:
1
開始ページ:
712213-1
終了ページ:
712213-5
総ページ数:
5
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473554 [0819473553]
言語:
英語
請求記号:
P63600/7122
資料種別:
国際会議録

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