Results obtained with the CHARPAN Engineering Tool and prospects of the ion Mask Exposure Tool (iMET) (Second Place Best Paper Award)

Results obtained with the CHARPAN Engineering Tool and prospects of the ion Mask Exposure Tool (iMET) (Second Place Best Paper Award)

著者名:

E. Platzgummer ( IMS Nanofabrication AG, Austria )
H. Loeschner ( IMS Nanofabrication AG, Austria )
G. Gross ( IMS Nanofabrication AG, Austria )

掲載資料名:

Photomask technology 2008

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7122

発行年:

2008

巻:

1

開始ページ:

71220L-1

終了ページ:

71220L-7

総ページ数:

7

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473554 [0819473553]

言語:

英語

請求記号:

P63600/7122

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052753
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2008 : 28th
会議開催地:	Monterey, California, USA
会議開催年:	2008.10.07-2008.10.10
論文注記:	Photomask technology 2008, 7-10 October 2008, Monterey, California, USA - Session 4. Patterning Technologies and Tools, 71220L, 7122-19

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