Results obtained with the CHARPAN Engineering Tool and prospects of the ion Mask Exposure Tool (iMET) (Second Place Best Paper Award)
- 著者名:
- E. Platzgummer ( IMS Nanofabrication AG, Austria )
- H. Loeschner ( IMS Nanofabrication AG, Austria )
- G. Gross ( IMS Nanofabrication AG, Austria )
- 掲載資料名:
- Photomask technology 2008
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 7122
- 発行年:
- 2008
- 巻:
- 1
- 開始ページ:
- 71220L-1
- 終了ページ:
- 71220L-7
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819473554 [0819473553]
- 言語:
- 英語
- 請求記号:
- P63600/7122
- 資料種別:
- 国際会議録
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2
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Projection maskless lithography (PML2): proof-of-concept setup and first experimental results
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