Optimization of measuring conditions for templates of UV nano imprint lithography

Optimization of measuring conditions for templates of UV nano imprint lithography

著者名:

K. Yoshida ( Dai Nippon Printing Co., Ltd., Japan )
K. Kojima ( Dai Nippon Printing Co., Ltd., Japan )
M. Abe ( Dai Nippon Printing Co., Ltd., Japan )
S. Sasaki ( Dai Nippon Printing Co., Ltd., Japan )
M. Kurihara ( Dai Nippon Printing Co., Ltd., Japan )

掲載資料名:

Photomask and next-generation lithography mask technology XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7028

発行年:

2008

巻:

2

開始ページ:

70281V-1

終了ページ:

70281V-8

総ページ数:

8

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819472434 [0819472433]

言語:

英語

請求記号:

P63600/7028

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052659
シリーズID:	PA00000029
会議名:	Photomask and Next-Generation Lithography Mask Technology
回次:	2008 : 15th
会議開催地:	Yokohama, Japan
会議開催年:	2008.04.16-2008.04.18
論文注記:	Photomask and next-generation lithography mask technology XV, 16-18 April 2008, Yokohama, Japan - Poster Session 5a: NGL, 70281V, 7028-65

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4 国際会議録 Surface energy control techniques for photomask fabrication and their characterizations with scanning probe microscopy M. Kurihara, S. Hatakeyama, K. Yoshida, M. Abe, D. Totsukawa Society of Photo-optical Instrumentation Engineers	10 国際会議録 SWS grating for UV band filter by nano-imprint J.-S. Lin, K.-H. Liao, C.-T. Chen, C.-L. Lai, C.-H. Ko Society of Photo-optical Instrumentation Engineers
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