Separable OPC models for computational lithography

Separable OPC models for computational lithography

著者名:

H. -Y. Liu ( Brion Technologies, Inc., USA )
Q. Zhao ( Brion Technologies, Inc., USA )
J. F. Chen ( Brion Technologies, Inc., USA )
J. Jiang ( Brion Technologies, Inc., USA )
R. Socha ( ASML Technology Development Ctr., USA )

掲載資料名:

Photomask and next-generation lithography mask technology XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7028

発行年:

2008

巻:

1

開始ページ:

70280X-1

終了ページ:

70280X-11

総ページ数:

11

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819472434 [0819472433]

言語:

英語

請求記号:

P63600/7028

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052659
シリーズID:	PA00000029
会議名:	Photomask and Next-Generation Lithography Mask Technology
回次:	2008 : 15th
会議開催地:	Yokohama, Japan
会議開催年:	2008.04.16-2008.04.18
論文注記:	Photomask and next-generation lithography mask technology XV, 16-18 April 2008, Yokohama, Japan - OPC and Lithography Technologies I, 70280X, 7028-32

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