Mask image position correction for double patterning lithography

Mask image position correction for double patterning lithography

著者名:

M. Saito ( Toshiba Corp., Japan )
M. Itoh ( Toshiba Corp., Japan )
O. Ikenaga ( Toshiba Corp., Japan )
K. Ishigo ( Toshiba Corp., Japan )

掲載資料名:

Photomask and next-generation lithography mask technology XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

7028

発行年:

2008

巻:

1

開始ページ:

70280D-1

終了ページ:

70280D-9

総ページ数:

9

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819472434 [0819472433]

言語:

英語

請求記号:

P63600/7028

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052659
シリーズID:	PA00000029
会議名:	Photomask and Next-Generation Lithography Mask Technology
回次:	2008 : 15th
会議開催地:	Yokohama, Japan
会議開催年:	2008.04.16-2008.04.18
論文注記:	Photomask and next-generation lithography mask technology XV, 16-18 April 2008, Yokohama, Japan - Writing Technology, 70280D, 7028-12

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4 国際会議録 Mask pattern quality assurance based on lithography simulation with fine pixel SEM image [5992-59] Kariya, M., Yamanaka, E., tanaka, S., Ikeda, T., Yamaguchi, S., Hashimoto, K., Itoh, M., Kobayashi, H., Kawashima, T., … SPIE - The International Society of Optical Engineering	10 国際会議録 Enabling immersion lithography and double patterning K. M. Monahan, A. Widmann SPIE - The International Society of Optical Engineering
5 国際会議録 Fine pixel SEM image for mask pattern quality assurance based on lithography simulation [6283-48] Yamanaka, E., Kariya, M., Yamaguchi, S., Tanaka, S., Hashimoto, K., Itoh, M., Kobayashi, H., Kawashima, T., Narukawa, S. SPIE - The International Society of Optical Engineering	11 国際会議録 Effect of absorber material and mask pattern correction on pattern fidelity in EUV lithography Sugawara, M., Hashimoto, T., Nishiyama, I. SPIE - The International Society of Optical Engineering
6 国際会議録 Dependence of mask topography effects on pattern variation under hyper-NA lithography A. Mimotogi, M. Itoh, S. Mimotogi, K. Sato, T. Sato Society of Photo-optical Instrumentation Engineers	12 国際会議録 Coping with double-patterning/exposure lithography by EB mask writer EBM-6000 T. Kamikubo, R. Nishimura, K. Tsuruta, K. Hattori, J. Takamatsu Society of Photo-optical Instrumentation Engineers

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