Electrically driven optical proximity correction
- 著者名:
- S. Banerjee ( Univ. of Texas at Austin, USA )
- P. Elakkumanan ( IBM Corp., USA )
- L. W. Liebmann ( IBM Corp., USA )
- J. A. Culp ( IBM Corp., USA )
- M. Orshansky ( Univ. of Texas at Austin, USA )
- 掲載資料名:
- Design for manufacturability through design-process integration II : 28-29 February 2008, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6925
- 発行年:
- 2008
- 開始ページ:
- 69251W-1
- 終了ページ:
- 69251W-9
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471109 [0819471100]
- 言語:
- 英語
- 請求記号:
- P63600/6925
- 資料種別:
- 国際会議録
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Society of Photo-optical Instrumentation Engineers |
7
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Process, design and optical proximity correction requirements for the 65nm device generation
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Understanding across-chip line-width variation:the first step toward optical proximity correction
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国際会議録
Process, design, and optical proximity correction requirements for the 65-nm device generation
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |