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Layout patterning check for DFM

著者名:
  • C. C. Chang ( Taiwan Semiconductor Manufacturing Co. Ltd., Taiwan )
  • I. C. Shih ( Taiwan Semiconductor Manufacturing Co. Ltd., Taiwan )
  • J. F. Lin ( Taiwan Semiconductor Manufacturing Co. Ltd., Taiwan )
  • Y. S. Yen ( Taiwan Semiconductor Manufacturing Co. Ltd., Taiwan )
  • C. M. Lai ( Taiwan Semiconductor Manufacturing Co. Ltd., Taiwan )
掲載資料名:
Design for manufacturability through design-process integration II : 28-29 February 2008, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6925
発行年:
2008
開始ページ:
69251R-1
終了ページ:
69251R-7
総ページ数:
7
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471109 [0819471100]
言語:
英語
請求記号:
P63600/6925
資料種別:
国際会議録

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