APF pitch-halving for 22nm logic cells using gridded design rules

APF pitch-halving for 22nm logic cells using gridded design rules

著者名:

M. C. Smayling ( Tela Innovations, Inc., USA )
C. Bencher ( Applied Materials, Inc., USA )
H. D. Chen ( Applied Materials, Inc., USA )
H. Dai ( Applied Materials, Inc., USA )
M. P. Duane ( Applied Materials, Inc., USA )

掲載資料名:

Design for manufacturability through design-process integration II : 28-29 February 2008, San Jose, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6925

発行年:

2008

開始ページ:

69251E-1

終了ページ:

69251E-8

総ページ数:

8

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471109 [0819471100]

言語:

英語

請求記号:

P63600/6925

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052556
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Design for Manufacturability through Design-Process Integration
回次:	2008 : 2nd
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.28-2008.02.29
論文注記:	Design for manufacturability through design-process integration II, 28-29 February 2008, San Jose, California, USA. Poster Session, 69251E, 6925-48

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