SEM contour-based model OPC calibrated with optically sensitive patterns
- 著者名:
- J.-E. Jung ( Samsung Electronics Co., Ltd., South Korea )
- M.-K. Lee ( Samsung Electronics Co., Ltd., South Korea )
- Y.-J. Cho ( Samsung Electronics Co., Ltd., South Korea )
- S.-H. Lee ( Samsung Electronics Co., Ltd., South Korea )
- Y.-S. Kang ( Samsung Electronics Co., Ltd., South Korea )
- 掲載資料名:
- Design for manufacturability through design-process integration II : 28-29 February 2008, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6925
- 発行年:
- 2008
- 開始ページ:
- 692516-1
- 終了ページ:
- 692516-10
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471109 [0819471100]
- 言語:
- 英語
- 請求記号:
- P63600/6925
- 資料種別:
- 国際会議録
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