22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP)

22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP)

著者名:

C. Bencher ( Applied Materials, Inc., USA )
Y. Chen ( Applied Materials, Inc., USA )
H. Dai ( Applied Materials, Inc., USA )
W. Montgomery ( SUNY, Albany, USA )
L. Huli ( SUNY, Albany, USA )

掲載資料名:

Optical Microlithography XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6924

発行年:

2008

巻:

3

開始ページ:

69244E-1

終了ページ:

69244E-7

総ページ数:

7

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471093 [0819471097]

言語:

英語

請求記号:

P63600/6924

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052555
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2008 : 21st
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.26-2008.02.29
論文注記:	Optical Microlithography XXI, 26-29 February 2008, San Jose, California, USA. Poster Session: Process, 69244E, 6924-169

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