Resolution enhancement techniques in 65 nm node nested-hole patterning

Resolution enhancement techniques in 65 nm node nested-hole patterning

著者名:

H. Lee ( DongbuHiTek, South Korea )
J. Choi ( DongbuHiTek, South Korea )
J. Kim ( DongbuHiTek, South Korea )
J.-W. Han ( DongbuHiTek, South Korea )
K.-Y. Kim ( International Technology Alliances, Inc., USA )

掲載資料名:

Optical Microlithography XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6924

発行年:

2008

巻:

3

開始ページ:

69244B-1

終了ページ:

69244B-8

総ページ数:

8

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471093 [0819471097]

言語:

英語

請求記号:

P63600/6924

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052555
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2008 : 21st
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.26-2008.02.29
論文注記:	Optical Microlithography XXI, 26-29 February 2008, San Jose, California, USA. Poster Session: Process, 69244B, 6924-164

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