Combined mask and illumination scheme optimization for robust contact patterning on 45nm technology node flash memory devices

Combined mask and illumination scheme optimization for robust contact patterning on 45nm technology node flash memory devices

著者名:

A. Vaglio Pret ( STMicroelectronics, Italy )
G. Capetti ( STMicroelectronics, Italy )
M. Bollin ( STMicroelectronics, Italy )
G. Cotti ( STMicroelectronics, Italy )
D. De Simone ( STMicroelectronics, Italy )

掲載資料名:

Optical Microlithography XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6924

発行年:

2008

巻:

2

開始ページ:

69243B-1

終了ページ:

69243B-12

総ページ数:

12

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471093 [0819471097]

言語:

英語

請求記号:

P63600/6924

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052555
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2008 : 21st
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.26-2008.02.29
論文注記:	Optical Microlithography XXI, 26-29 February 2008, San Jose, California, USA. Poster Session: Low-k1 Lithography, 69243B, 6924-120

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2 国際会議録 Customized illumination schemes for critical layers of 90-nm node dense memory devices in ArF lithography: comparison between simulation and experimental … Capetti, G., Bollin, M., Pepe, A., Cotti, G., Loi, S., Iessi, U. SPIE - The International Society of Optical Engineering	8 国際会議録 Contact and via hole mask design optimization for 65-nm technology node Van Den Broeke, D., Shi, X., Socha, R., Laidig, T., Hollerbach, U., Wampler, K. E., Hsu, S., Chen, J. F., Corcoran, N. … SPIE - The International Society of Optical Engineering
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4 国際会議録 Mask enhancer technology for 45-nm node contact hole fabrication Yuito, T., Wiaux, V., Look, L. Van, Vandenberghe, G., Irie, S., Matsuo, T., Misaka, A., Watanabe, H., Sasago, M. SPIE - The International Society of Optical Engineering	10 国際会議録 Evaluation of double focal plane exposure technique for 248-nm and 193-nm lithography for semidense trenches and contacts Weisbuch, F., Enrichi, F., Capetti, G., Bianucci, G., Cotti, G. SPIE-The International Society for Optical Engineering
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