60nm half pitch contact layer printing: exploring the limits at 1.35NA lithography
- 著者名:
- J. Bekaert ( IMEC vzw, Belgium )
- E. Hendrickx ( IMEC vzw, Belgium )
- G. Vandenberghe ( IMEC vzw, Belgium )
- 掲載資料名:
- Optical Microlithography XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6924
- 発行年:
- 2008
- 巻:
- 2
- 開始ページ:
- 69243A-1
- 終了ページ:
- 69243A-12
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471093 [0819471097]
- 言語:
- 英語
- 請求記号:
- P63600/6924
- 資料種別:
- 国際会議録
類似資料:
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
9
国際会議録
Simulation of dense contact hole (K1=O.35) arrays with 193-nm immersion lithography [6154-106]
SPIE - The International Society of Optical Engineering |
4
国際会議録
Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node [5992-61]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |