A novel photo-thermal setup for determination of absorptance losses and wavefront deformations in DUV optics

A novel photo-thermal setup for determination of absorptance losses and wavefront deformations in DUV optics

著者名:

K. Mann ( Laser-Lab. Göttingen e.V., Germany )
A. Bayer ( Laser-Lab. Göttingen e.V., Germany )
U. Leinhos ( Laser-Lab. Göttingen e.V., Germany )
T. Miege ( Laser-Lab. Göttingen e.V., Germany )
B. Schäfer ( Laser-Lab. Göttingen e.V., Germany )

掲載資料名:

Optical Microlithography XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6924

発行年:

2008

巻:

2

開始ページ:

69242P-1

終了ページ:

69242P-10

総ページ数:

10

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471093 [0819471097]

言語:

英語

請求記号:

P63600/6924

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052555
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2008 : 21st
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.26-2008.02.29
論文注記:	Optical Microlithography XXI, 26-29 February 2008, San Jose, California, USA. Poster Session: Lithography Tools, 69242P, 6924-98

類似資料:

1 国際会議録 A novel photo-thermal setup for evaluation of absorption losses and thermal wavefront deformations in DUV optics K. Mann, A. Bayer, T. Miege, U. Leinhos, B. Schäfer Society of Photo-optical Instrumentation Engineers	7 国際会議録 Comparative studies of absorptance behavior and laser-induced fluorescene of alkaline-earth fluorides at 193 and 157 nm Goerling, Ch., Leinhos, U., Mann, K.R. SPIE-The International Society for Optical Engineering
2 国際会議録 Characterization of absorptance losses in optical materials using a high resolution Hartmann-Shack wavefront sensor A. Bayer, F. Barkusky, U. Leinhos, T. Miege, B. Schäfer Society of Photo-optical Instrumentation Engineers	8 国際会議録 Scatter and absorption losses from DUV optics:a comparative study Apel,O., Mann,K.R. SPIE - The International Society for Optical Engineering
3 国際会議録 Photothermal measurement of absorption and wavefront deformations in fused silica K. Mann, A. Bayer, J. Gloger, U. Leinhos, T. Rousseau Society of Photo-optical Instrumentation Engineers	9 国際会議録 Testing of optical components for microlithography at 193- and 157-nm Mann,K.R., Apel,O., Eckert,G., Gorling,C., Leinhos,U., Schafer,B. SPIE-The International Society for Optical Engineering
4 国際会議録 Characterization of absorption losses in deep UV optical materials K. Mann, U. Leinhos, B. Schäfer SPIE - The International Society of Optical Engineering	10 国際会議録 Interfacial absorption of DUV coatings Apel,O., Schulz-Grosser,M., Leinhos,U., Kennedy,M., Mann,K.R., Schuhmann,R.G. SPIE-The International Society for Optical Engineering
5 国際会議録 CHARISMA: a new way for angular-resolved scattering measurements Apel,O., Gorling,C., Leinhos,U., Mann,K.R., Schafer,B. SPIE-The International Society for Optical Engineering	11 国際会議録 Accuracy of laser beam parameters and beam propagation from real-time Hartmann-Shack experiments B. Schafer, K. Mann SPIE - The International Society of Optical Engineering
6 国際会議録 Characterization of DUV and VUV optical components Mann, K.R., Eckert, G., Goerling, C., Leinhos, U., Schaefer, B. SPIE-The International Society for Optical Engineering	12 国際会議録 Direct photo-etching of PMMA by focused EUV radiation from a compact laser plasma source F. Barkusky, A. Bayer, C. Peth, K. Mann Society of Photo-optical Instrumentation Engineers

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