Extending scatterometry to the measurements of sub 40 nm features, double patterning structures, and 3D OPC patterns

Extending scatterometry to the measurements of sub 40 nm features, double patterning structures, and 3D OPC patterns

著者名:

O. Kritsun ( AMD, USA )
B. La Fontaine ( AMD, USA )
Y. Liu ( Nanometrics, Inc., USA )
C. S. Saravanan ( Nanometrics, Inc., USA )

掲載資料名:

Optical Microlithography XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6924

発行年:

2008

巻:

1

開始ページ:

69241M-1

終了ページ:

69241M-9

総ページ数:

9

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471093 [0819471097]

言語:

英語

請求記号:

P63600/6924

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052555
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2008 : 21st
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.26-2008.02.29
論文注記:	Optical Microlithography XXI, 26-29 February 2008, San Jose, California, USA. Session 12. Process II, 69241M, 6924-57

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