Focus, dynamics, and defectivity performance at wafer edge in immersion lithography
- 著者名:
- T. Tamura ( NEC Electronics Corp., Japan )
- N. Onoda ( NEC Electronics Corp., Japan )
- M. Fujita ( NEC Electronics Corp., Japan )
- T. Uchiyama ( NEC Electronics Corp., Japan )
- 掲載資料名:
- Optical Microlithography XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6924
- 発行年:
- 2008
- 巻:
- 1
- 開始ページ:
- 692419-1
- 終了ページ:
- 692419-12
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471093 [0819471097]
- 言語:
- 英語
- 請求記号:
- P63600/6924
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
4
国際会議録
The use of unpatterned wafer inspection for immersion lithography defectivity studies [6152-68]
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |