Split and design guidelines for double patterning

Split and design guidelines for double patterning

著者名:

V. Wiaux ( IMEC, Belgium )
S. Verhaegen ( IMEC, Belgium )
S. Cheng ( IMEC, Belgium )
F. Iwamoto ( IMEC, Belgium )
P. Jaenen ( IMEC, Belgium )

掲載資料名:

Optical Microlithography XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6924

発行年:

2008

巻:

1

開始ページ:

692409-1

終了ページ:

692409-11

総ページ数:

11

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471093 [0819471097]

言語:

英語

請求記号:

P63600/6924

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052555
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2008 : 21st
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.26-2008.02.29
論文注記:	Optical Microlithography XXI, 26-29 February 2008, San Jose, California, USA. Session 2. Double Masking I, 692409, 6924-08

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