Adamantane-based molecular gloss resist for 193-nm lithography and beyond
- 著者名:
- S. Tanaka ( Idemitsu Kosan Co., Ltd., Japan )
- N. Matsumoto ( Idemitsu Kosan Co., Ltd., Japan )
- H. Ohno ( Idemitsu Kosan Co., Ltd., Japan )
- N. Hatakeyama ( Idemitsu Chemicals U.S.A. Corp., USA )
- K. Ito ( Idemitsu Kosan Co., Ltd., Japan )
- 掲載資料名:
- Advances in resist materials and processing technology XXV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6923
- 発行年:
- 2008
- 巻:
- 1
- 開始ページ:
- 69231J-1
- 終了ページ:
- 69231J-8
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471086 [0819471089]
- 言語:
- 英語
- 請求記号:
- P63600/6923
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
国際会議録
Evaluation of chemically amplified resist based on adamantyl methacrylate for 193-nm lithography
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |