Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials
- 著者名:
- B. M. Rathsack ( Tokyo Electron America Inc., USA )
- S. Scheer ( Tokyo Electron America Inc., USA )
- Y. Kuwahara ( Tokyo Electron Kyushu Ltd., Japan )
- J. Kitano ( Tokyo Electron Kyushu Ltd., Japan )
- R. Gronheid ( IMEC, Belgium )
- 掲載資料名:
- Advances in resist materials and processing technology XXV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6923
- 発行年:
- 2008
- 巻:
- 1
- 開始ページ:
- 692315-1
- 終了ページ:
- 692315-11
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471086 [0819471089]
- 言語:
- 英語
- 請求記号:
- P63600/6923
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
10
国際会議録
Optical coupling of lens, liquid and resist in immersion lithography: rigorous model and assessment
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |