Development and evaluation of 193nm immersion generation-three fluid candidates

Development and evaluation of 193nm immersion generation-three fluid candidates

著者名:

P. A. Zimmerman ( SEMATECH, USA )
J. Byers ( SEMATECH, USA )
B. Rice ( SEMATECH, USA )
C. K. Ober ( Cornell Univ., USA )
E. P. Giannelis ( Cornell Univ., USA )

掲載資料名:

Advances in resist materials and processing technology XXV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6923

発行年:

2008

巻:

1

開始ページ:

69230A-1

終了ページ:

69230A-10

総ページ数:

10

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471086 [0819471089]

言語:

英語

請求記号:

P63600/6923

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052554
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in Resist Materials and Processing Technology
回次:	2008 : 25th
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.25-2008.02.27
論文注記:	Advances in resist materials and processing technology XXV, 25-27 February 2008, San Jose, California, USA. Session 3. Materials and Processes for Immersion Lithography II, 69230A, 6923-09

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1 国際会議録 Development of an operational high refractive index resist for 193nm immersion lithography P. A. Zimmerman, J. Byers, E. Piscani, B. Rice, C. K. Ober Society of Photo-optical Instrumentation Engineers	7 国際会議録 An analysis of double exposure lithography options S. Lee, J. Byers, K. Jen, P. Zimmerman, B. Rice Society of Photo-optical Instrumentation Engineers
2 国際会議録 Silsesquioxane-based 193 nm bilayer resists: characterization and lithographic evaluation Bravo-Vasquez, J. P., Kwark, Y.-J., Ober, C. K., Cao, H. B., Deng, H. SPIE - The International Society of Optical Engineering	8 国際会議録 Reactive ion etching of 193-nm resist candidates: current platforms and future requirements Wallow,T.I., Brock,P.J., DiPietro,R.A., Allen,R.D., Opitz,J., Sooriyakumaran,R., Hofer,D.C., Meute,J., Byers,J.D., … SPIE-The International Society for Optical Engineering
3 国際会議録 Continuing 193nm optical lithography for 32nm imaging and beyond E. C. Piscani, D. Ashworth, J. Byers, C. Van Peski, P. Zimmerman Society of Photo-optical Instrumentation Engineers	9 国際会議録 Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry O. Kritsun, B. L. Fontaine, R. Sandberg, A. Acheta, H. J. Levinson, K. Lensing, M. Dusa, J. Hauschild, A. Pici, C. … SPIE - The International Society of Optical Engineering
4 国際会議録 Second generation fluids for 193 nm immersion lithography Yu, S.-S., Lin, B. J. SPIE - The International Society of Optical Engineering	10 国際会議録 193nm dual layer organic BARCS for high NA immersion lithography Montgomery, P. K., Peters, R., Garza, C., Cobb, J., Darlington, B., Parker, C., Filipiak, S., Babbitt, D. SPIE - The International Society of Optical Engineering
5 国際会議録 Second generation fluids for 193nm immersion lithography [6154-42] French, R. H., Qiu, W., Yang, M. K., Wheland, R. C., Lemon, M. F., Shoe, A. L., Adelman, D. J., Crawford, M. K., Tran, … SPIE - The International Society of Optical Engineering	11 国際会議録 Outlook for potential third-generation immersion fluids J. Lopez-Gejo, J. T. Kunjappu, J. Zhou, B. W. Smith, P. Zimmerman, W. Conley, N. J. Turro SPIE - The International Society of Optical Engineering
6 国際会議録 193-nm single-layer process for 150-nm technology generation and below Amblard, G. R., Zandbergen, P., McCallum, M., Stephen, A., Byers, J. D., Dean, K. R., Meute, J., Nelson, C. M. SPIE - The International Society of Optical Engineering	12 国際会議録 Novel high-index resists for 193-nm immersion lithography and beyond I. Blakey, L. Chen, B. Dargaville, H. Liu, A. Whittaker, W. Conley, E. Piscani, G. Rich, A. Williams, P. Zimmerman SPIE - The International Society of Optical Engineering

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