MuGFET observation and CD measurement by using CD-SEM
- 著者名:
- T. Maeda ( Hitachi High-Technologies Corp., Japan )
- M. Tanaka ( Hitachi,Ltd., Japan )
- M. lsawa ( Hitachi High-Technologies Corp., Japan )
- K. Watanabe ( Hitachi High-Technologies Corp., Japan )
- N. Hasegawa ( Hitachi High-Technologies Corp., Japan )
- 掲載資料名:
- Metrology, inspection, and process control for microlithography XXII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6922
- 発行年:
- 2008
- 巻:
- 2
- 開始ページ:
- 69222P-1
- 終了ページ:
- 69222P-9
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471079 [0819471070]
- 言語:
- 英語
- 請求記号:
- P63600/6922
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
5
国際会議録
Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |