Probe-pattern grating focus monitor through scatterometry calibration

Probe-pattern grating focus monitor through scatterometry calibration

著者名:

J. Xue ( Univ. of California, Berkeley, USA )
C. J. Spanos ( Univ. of California, Berkeley, USA )
A. R. Neureuther ( Univ. of California, Berkeley, USA )

掲載資料名:

Metrology, inspection, and process control for microlithography XXII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6922

発行年:

2008

巻:

2

開始ページ:

692225-1

終了ページ:

692225-12

総ページ数:

12

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471079 [0819471070]

言語:

英語

請求記号:

P63600/6922

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052553
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2008 : 22nd
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.25-2008.02.28
論文注記:	Metrology, inspection, and process control for microlithography XXII, San Jose, California, USA, 25-28 February 2008 - Poster Session (692225/6922-63)

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1 国際会議録 Parameter sensitive patterns for scatterometry monitoring J. Xue, Y. Ben, C. Wang, M. Miller, C. J. Spanos Society of Photo-optical Instrumentation Engineers	7 国際会議録 Interferometric-probe aberration monitor performance in the production environment Robins, G.C., Neureuther, A.R., Dusa, M., Kye, J. SPIE - The International Society of Optical Engineering
2 国際会議録 Using composite gratings for optical system characterization through scatterometry Y. Ben, J. Xue, C. J. Spanos Society of Photo-optical Instrumentation Engineers	8 国際会議録 Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography C. S. Saravanan, S. Nirmalgandhi, O. Kritsun, A. Acheta, R. Sandberg, B. L. Fontaine, H. J. Levinson, K. Lensing, M. … SPIE - The International Society of Optical Engineering
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6 国際会議録 Illumination, mask, and tool effects on pattern and probe-based aberration monitors Robins, G.C., Neureuther, A.R. SPIE-The International Society for Optical Engineering	12 国際会議録 Subwavelength photoresist grating metrology using scatterometry M.R. Murnane, C.J. Raymond, S.S.H. Naqvi, J.R. McNeil Society of Photo-optical Instrumentation Engineers

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