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Exploring the limitations of x-ray reflectivity as a critical dimension pattern shape metrology

著者名:
  • H.-J. Lee ( National Institute of Standards and Technology, USA )
  • S. Kim ( National Institute of Standards and Technology, USA )
  • C. L. Soles ( National Institute of Standards and Technology, USA )
  • E. K. Lin ( National Institute of Standards and Technology, USA )
  • W. Wu ( National Institute of Standards and Technology, USA )
掲載資料名:
Metrology, inspection, and process control for microlithography XXII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6922
発行年:
2008
巻:
2
開始ページ:
692224-1
終了ページ:
692224-8
総ページ数:
8
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471079 [0819471070]
言語:
英語
請求記号:
P63600/6922
資料種別:
国際会議録

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