Opportunities and challenges for optical CD metrology in double patterning process control

Opportunities and challenges for optical CD metrology in double patterning process control

著者名:

D. C. Wack ( KLA-Tencor, USA )
J. Hench ( KLA-Tencor, USA )
L. Poslavsky ( KLA-Tencor, USA )
J. Fielden ( KLA-Tencor, USA )
V. Zhuang ( KLA-Tencor, USA )

掲載資料名:

Metrology, inspection, and process control for microlithography XXII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6922

発行年:

2008

巻:

1

開始ページ:

69221N-1

終了ページ:

69221N-9

総ページ数:

9

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471079 [0819471070]

言語:

英語

請求記号:

P63600/6922

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052553
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2008 : 22nd
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.25-2008.02.28
論文注記:	Metrology, inspection, and process control for microlithography XXII, San Jose, California, USA, 25-28 February 2008 - Session 12. Scatterometry II (69221N/6922-60)

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