Measurement of high-k and metal film thickness on FinFET sidewalls using scatterometry

Measurement of high-k and metal film thickness on FinFET sidewalls using scatterometry

著者名:

T. G. Dziura ( KLA-Tencor, USA )
B. Bunday ( International SEMATECH Manufacturing Initiative, USA )
C. Smith ( SEMATECH, USA )
M. M. Hussain ( SEMATECH, USA )
R. Harris ( SEMATECH, USA )

掲載資料名:

Metrology, inspection, and process control for microlithography XXII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6922

発行年:

2008

巻:

1

開始ページ:

69220V-1

終了ページ:

69220V-8

総ページ数:

8

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471079 [0819471070]

言語:

英語

請求記号:

P63600/6922

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052553
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2008 : 22nd
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.25-2008.02.28
論文注記:	Metrology, inspection, and process control for microlithography XXII, San Jose, California, USA, 25-28 February 2008 - Session 6. Scatterometry I (69220V/6922-29)

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