Evaluating diffraction based overlay metrology for double patterning technologies

Evaluating diffraction based overlay metrology for double patterning technologies

著者名:

C. S. Saravanan ( Nanometrics,INC., USA )
Y. Liu ( Nanometrics,INC., USA )
P. Dasari ( Nanometrics,INC., USA )
O. Kritsun ( Advanced Micro Devices,INC., USA )
C. Volkman ( Advanced Micro Devices,INC., USA )

掲載資料名:

Metrology, inspection, and process control for microlithography XXII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6922

発行年:

2008

巻:

1

開始ページ:

69220C-1

終了ページ:

69220C-12

総ページ数:

12

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471079 [0819471070]

言語:

英語

請求記号:

P63600/6922

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052553
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2008 : 22nd
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.25-2008.02.28
論文注記:	Metrology, inspection, and process control for microlithography XXII, San Jose, California, USA, 25-28 February 2008 - Session 3. Methods for Tomorrow (69220C/6922-10)

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