EUV simulation extension study for mask shadowing effect and its correction

EUV simulation extension study for mask shadowing effect and its correction

著者名:

H. Kang ( ASML Korea Co., Ltd., South Korea )
S. Hansen ( ASML US,Inc., USA )
J. van Schoot ( ASML Netherlands B.V., Netherlands )
K. van lngen Schenau ( ASML Netherlands B.V., Netherlands )

掲載資料名:

Emerging lithographic technologies XII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6921

発行年:

2008

巻:

2

開始ページ:

69213I-1

終了ページ:

69213I-11

総ページ数:

11

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471062 [0819471062]

言語:

英語

請求記号:

P63600/6921

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052552
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2008 : 12th
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.26-2008.02.28
論文注記:	Emerging lithographic technologies XII, San Jose, California, USA, 26-28 February 2008 - Poster Session: EUV Imaging (69213I/6921-130)

類似資料:

1 国際会議録 Photoresist induced contrast loss and its Impact on EUV imaging extendibility K. van lngen Schenau, S. Hansen, B. Pierson, J. van Schoot Society of Photo-optical Instrumentation Engineers	7 国際会議録 The study of attenuated PSM structure for extreme ultraviolet lithography with minimized mask shadowing effect C. Y. Jeong, B. H. Kim, T. G. Kim, S. Lee, E. J. Kim Society of Photo-optical Instrumentation Engineers
2 国際会議録 Mask error factor:causes and implications for process latitude Schoot,J.van, Finders,J., Schenau,K.van Ingen, Klaassen,M., Buijk,C. SPIE - The International Society for Optical Engineering	8 国際会議録 Correction technique of EBM-6000 prepared for EUV mask writing S. Yoshitake, H. Sunaoshi, J. Yashima, S. Tamamushi, M. Ogasawara Society of Photo-optical Instrumentation Engineers
3 国際会議録 Comparative study of mask architectures for EUV lithography Pawloski, A. R., La Fontaine, B., Levinson, H. J., Hirscher, S., Schwarzl, S., Lowack, K., Kamm, F. -M., Bender, M., … SPIE - The International Society of Optical Engineering	9 国際会議録 TaN-based EUV mask absorber etch study [6283-84] Du, Y., Choi, J. C., Zhang, G., Park, -J. S., Yan, -Y. P., Baik, -H. K. SPIE - The International Society of Optical Engineering
4 国際会議録 A study for effect of rounded contact hole pattern by laser mask writng machine onto wafer process margin [6283-15] Park, -J. S., Yoon, -H. K., Kang, -H. J., Choi, -Y. J., Lee, -S. Y., Kim. K. SPIE - The International Society of Optical Engineering	10 国際会議録 Automatic red eye correction and its quality metric I. V. Safonov, M. N. Rychagov, K. Kang, S. H. Kim Society of Photo-optical Instrumentation Engineers
5 国際会議録 Optical proximity correction using a transmittance-controlled mask (TCM) W.-S. Han, C.-J. Sohn, Y.-B. Kim, K.-H. Kim, H.-K. Kang Society of Photo-optical Instrumentation Engineers	11 国際会議録 Shadowing effect minimization in EUV mask by modeling Besacier, M., Schiavone, P. SPIE - The International Society of Optical Engineering
6 国際会議録 Simulation and experiments for inspection properties of EUV mask defects [6283-85] Park, J., Kim, -S. S., Lee, S., Woo, -G. S., Cho, -K. H., Moon, -T. J. SPIE - The International Society of Optical Engineering	12 国際会議録 Modeling of charging effect and its correction by EB mask writer EBM-6000 N. Nakayamada, S. Wake, T. Kamikubo, H. Sunaoshi, S. Tamamushi Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12