EUV optics contamination studies in presence of selected hydrocarbons

EUV optics contamination studies in presence of selected hydrocarbons

著者名:

R. Garg ( Univ. at Albany, USA )
A. Wüest ( SEMATECH, USA )
E. Gullikson ( Lawrence Berkeley National Lab., USA )
S. Bajt ( DESY, Germany )
G. Denbeaux ( Univ. at Albany, USA )

掲載資料名:

Emerging lithographic technologies XII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6921

発行年:

2008

巻:

2

開始ページ:

692136-1

終了ページ:

692136-8

総ページ数:

8

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471062 [0819471062]

言語:

英語

請求記号:

P63600/6921

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052552
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2008 : 12th
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.26-2008.02.28
論文注記:	Emerging lithographic technologies XII, San Jose, California, USA, 26-28 February 2008 - Poster Session: EUV Contamination (692136/6921-119)

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