Magic: a European program to push the insertion of maskless lithography

Magic: a European program to push the insertion of maskless lithography

著者名:

L. Pain ( CEA-LETI, MINATEC, France )
B. Icard ( CEA-LETI, MINATEC, France )
S. Tedesco ( CEA-LETI, MINATEC, France )
B. Kampherbeek ( MAPPER Lithography B. V., Netherlands )
G. Gross ( IMS Nanofabrication AG, Austria )

掲載資料名:

Emerging lithographic technologies XII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6921

発行年:

2008

巻:

1

開始ページ:

69211S-1

終了ページ:

69211S-12

総ページ数:

12

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471062 [0819471062]

言語:

英語

請求記号:

P63600/6921

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052552
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2008 : 12th
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.26-2008.02.28
論文注記:	Emerging lithographic technologies XII, San Jose, California, USA, 26-28 February 2008 - Session 13. EBDW II (69211S/6921-49)

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1 国際会議録 Electron beam lithography simulation based on a single convolution approach: application for sub-45nm nodes J. C. L. denmat, S. Manakli, B. Icard, C. Soonekindt, B. Minghetti, O. L. borgne, L. Pain SPIE - The International Society of Optical Engineering	7 国際会議録 Layout decompression chip for maskless lithography Nikolic, B., Wild, B., Dai, V., Shroff, Y.A., Warlick, B., Zakhor, A., Oldham, W.G. SPIE - The International Society of Optical Engineering
2 国際会議録 High throughput maskless lithography: low voltage versus high voltage S. W. H. K. Steenbrink, B. J. Kampherbeek, M. J. Wieland, J. H. Chen, S. M. Chang Society of Photo-optical Instrumentation Engineers	8 国際会議録 Negative-tone CAR resists for e-beam lithography: modification of chemical composition for R&D application ( high resolution ) or production application ( high … Charpin, M., Pain, L., Tedesco, S.V., Gourgon, C., Andrei, A., Henry, D., LaPlanche, Y., Hanawa, R., Kusumoto, T., … SPIE-The International Society for Optical Engineering
3 国際会議録 Bake condition effect on hybrid lithography process for negative-tone chemically amplified resists Pain,L., Sala,F., Higgins,C., Dal'zotto,B., Tedesco,S.V. SPIE - The International Society for Optical Engineering	9 国際会議録 Large-field ion optics for projection and proximity printing and for maskless lithography (MLZ) Loeschner, H., Stengl, G., Buschbeck, H., Chalupka, A., Lammer, G., Platzgummer, E., Vonach, H., de Jager, P.W.H., … SPIE-The International Society for Optical Engineering
4 国際会議録 Dynamic Maskless Holographic Lithography Nathan J. Jenness, Kurt D. Wulff, Matthew S. Johannes, Daniel G. Cole, Robert L. Clark American Society of Mechanical Engineers	10 国際会議録 Projection maskless lithography (PML2): proof-of-concept setup and first experimental results C. Klein, E. Platzgummer, H. Loeschner, G. Gross, P. Dolezel Society of Photo-optical Instrumentation Engineers
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