Projection maskless lithography (PML2): proof-of-concept setup and first experimental results

Projection maskless lithography (PML2): proof-of-concept setup and first experimental results

著者名:

C. Klein ( IMS Nanofabrication AG, Austria )
E. Platzgummer ( IMS Nanofabrication AG, Austria )
H. Loeschner ( IMS Nanofabrication AG, Austria )
G. Gross ( IMS Nanofabrication AG, Austria )
P. Dolezel ( Delong Instruments, Czech Republic )

掲載資料名:

Emerging lithographic technologies XII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6921

発行年:

2008

巻:

1

開始ページ:

69211O-1

終了ページ:

69211O-8

総ページ数:

8

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471062 [0819471062]

言語:

英語

請求記号:

P63600/6921

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052552
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2008 : 12th
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.26-2008.02.28
論文注記:	Emerging lithographic technologies XII, San Jose, California, USA, 26-28 February 2008 - Session 12. Parallel E-Beam Systems, Invited paper (69211O/6921-93)

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2 国際会議録 Projection maskless lithography Brandstatter, C., Loeschner, H., Stengl, G., Lammer, G., Buschbeck, H., Platzgummer, E., Doring, H.-J., Elster, T., … SPIE - The International Society of Optical Engineering	8 国際会議録 SCALPEL proof-of-concept system:preliminary lithography results Waskiewicz,W.K., Biddick,C.J., Blakey,M.I., Brady,K.J., Camarda,R.M., Connelly,W.F., Crorken,A.H., Custy,J.P., … SPIE-The International Society for Optical Engineering
3 国際会議録 Results obtained with the CHARPAN Engineering Tool and prospects of the ion Mask Exposure Tool (iMET) (Second Place Best Paper Award) E. Platzgummer, H. Loeschner, G. Gross Society of Photo-optical Instrumentation Engineers	9 国際会議録 Resistless Patterning of Magnetic Storage Media Using Ion Projection Structuring Dietzel, A., Berger, R., Grimm, H., Schug, C., Bruenger, W.H., Dzionk, C., Letzkus, F., Springer, R., Loeschner, H., … Materials Research Society
4 国際会議録 Demonstrators: a vital step forward for projection mask-less lithography (PML2) Brandstaetter, C., Haugeneder, E., Doering, H.-J., Elster, T., Heinitz, J., Fortagne, O., Eder-Kapl, S., Lammer, G., … SPIE - The International Society of Optical Engineering	10 国際会議録 Status of Ion Projection Lithography Bruenger, Wilhelm H., Kaesmaier, Rainer, Loeschner, Hans, Springer, Reinhard Materials Research Society
5 国際会議録 Large-field ion optics for projection and proximity printing and for maskless lithography (MLZ) Loeschner, H., Stengl, G., Buschbeck, H., Chalupka, A., Lammer, G., Platzgummer, E., Vonach, H., de Jager, P.W.H., … SPIE-The International Society for Optical Engineering	11 国際会議録 Ion projection lithography (IPL): posters presented at the 5th International SEMATECH Next-Generation Lithography (NGL) workdhop (Invited Poster) Kaesmaier, R., Loeschner, H., de Jager, P.W.H., Ehrmann, A., Hirscher, S., Kragler, K., Springer, R., Stengl, G., … SPIE-The International Society for Optical Engineering
6 国際会議録 Proof-of-concept tool development for projection mask-less lithography (PML2) Sasaki, A., Nishihara, K., Koike, F., Kagawa, K., Tanuma, H., Sunahara, A., Gamada, K., Nishikawa, T. SPIE - The International Society of Optical Engineering	12 国際会議録 Ion projection lithography (Invited Paper) Melngailis,J., Loschner,H., Stengl,G., Berry,I.L., Mondelli,A.A., Gross,G. SPIE-The International Society for Optical Engineering

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