The use of EUV lithography to produce demonstration devices

The use of EUV lithography to produce demonstration devices

著者名:

A. La Fontaine ( Advanced Micro Devices,Inc., USA )
Y. Deng ( Advanced Micro Devices,Inc., USA )
R. Kim ( Advanced Micro Devices,Inc., USA )
H. J. Levinson ( Advanced Micro Devices,Inc., USA )
S. McGowan ( Advanced Micro Devices,Inc., USA )

掲載資料名:

Emerging lithographic technologies XII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6921

発行年:

2008

巻:

1

開始ページ:

69210P-1

終了ページ:

69210P-10

総ページ数:

10

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471062 [0819471062]

言語:

英語

請求記号:

P63600/6921

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052552
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2008 : 12th
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.26-2008.02.28
論文注記:	Emerging lithographic technologies XII, San Jose, California, USA, 26-28 February 2008 - Session 5. EUV Systems (69210P/6921-25)

類似資料:

1 国際会議録 Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors La Fontaine, B., Pawloski, A.R., Deng, Y., Chovino, C., Dieu, L., Wood, O.R., II, Levinson, H.J. SPIE - The International Society of Optical Engineering	7 国際会議録 Integration considerations for 130-nm device patterning using ArF lithography Okoroanyanwu,U., Levinson,H.J., Yang,C.-Y., Pangrle,S.K., Schefske,J.A., Kent,E. SPIE - The International Society for Optical Engineering
2 国際会議録 Demonstration of phase-shift masks for extreme-ultraviolet lithography [6151-10] La Fontaine, B., Pawloski, A. R., Wood, O., Deng, Y., Levinson, H. J., Naulleau, P., Denham, P. E., Gullikson, E., Hoef, … SPIE - The International Society of Optical Engineering	8 国際会議録 Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging Deng, Y., Fontaine, B.M.L., Levinson, H.J., Neureuther, A.R. SPIE-The International Society for Optical Engineering
3 国際会議録 Comparative study of mask architectures for EUV lithography Pawloski, A. R., La Fontaine, B., Levinson, H. J., Hirscher, S., Schwarzl, S., Lowack, K., Kamm, F. -M., Bender, M., … SPIE - The International Society of Optical Engineering	9 国際会議録 Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography C. S. Saravanan, S. Nirmalgandhi, O. Kritsun, A. Acheta, R. Sandberg, B. L. Fontaine, H. J. Levinson, K. Lensing, M. … SPIE - The International Society of Optical Engineering
4 国際会議録 Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer T. Wallow, A. Acheta, Y. Ma, A. Pawloski, S. Bell, B. Ward, C. Tabery, B. L. Fontaine, R. Kim, S. McGowan, H. J. … SPIE - The International Society of Optical Engineering	10 国際会議録 Process-induced defects in sub-0.15-ｦﾌm device patterning using 193-nm lithography Okoroanyanwu,U., Pike,C., Levinson,H.J. SPIE - The International Society for Optical Engineering
5 国際会議録 Influence of antireflection coatings in ArF lithography La Fontaine, B.M., Pawloski, A.R., Acheta, A., Deng, Y., Levinson, H.J., Spence, C., Chovino, C., Dieu, L., Johnstone, … SPIE - The International Society of Optical Engineering	11 国際会議録 Impact of optical absorption on process control for sub-0.15-ｦﾌm device patterning using 193-nm lithography Okoroanyanwu,U., Levinson,H.J., Romero,J., Singh,B., Lee,S.-J. SPIE - The International Society for Optical Engineering
6 国際会議録 EUV mask making: an approach based on the direct patterning of the EUV reflector Chovino, C., Dieu, L., Johnstone, E., Reyes, J., La Fontaine, B.M., Levinson, H.J., Pawloski, A.R. SPIE - The International Society of Optical Engineering	12 国際会議録 Defect printability study using EUV lithography [6151-30] Holfeld, C., Bubke, K, Lehmann, F., La Fontaine, B., Pawloski, A.. R., Schwarzl, S., Kamm, F M, Graf T, Erdmann, A SPIE - The International Society of Optical Engineering

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