Breaking the limits: combination of electron beam lithography and nanoimprint lithography for production of next-generation magnetic media and optical media

Breaking the limits: combination of electron beam lithography and nanoimprint lithography for production of next-generation magnetic media and optical media

著者名:

B. Heidari ( Obducat AB, Sweden )
M. Beck ( Obducat AB, Sweden )

掲載資料名:

Emerging lithographic technologies XII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6921

発行年:

2008

巻:

1

開始ページ:

692103-1

終了ページ:

692103-5

総ページ数:

5

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471062 [0819471062]

言語:

英語

請求記号:

P63600/6921

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052552
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2008 : 12th
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.26-2008.02.28
論文注記:	Emerging lithographic technologies XII, San Jose, California, USA, 26-28 February 2008 - Session 1. Keynote Session, Keynote paper (692103/6921-02)

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