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Analysis of thermal stress damage in single-crystal silicon induced by 1064-nm long-pulse laser

著者名:
  • Y. Chen ( univ. of science and Technology, china )
  • J. Lu ( univ. of science and Technology, china )
  • X. Ni ( univ. of science and Technology, china )
掲載資料名:
Infrared materials, devices, and applications : 12-15 November 2007, Beijing, China
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6835
発行年:
2008
開始ページ:
68351X-1
終了ページ:
68351X-7
総ページ数:
7
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819470102 [0819470104]
言語:
英語
請求記号:
P63600/6835
資料種別:
国際会議録

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