Lithography options for the 32nm half pitch node and their implications on resist and material technology
- 著者名:
- Q. Gronheid ( IMEC, Belgium )
- E. Hendrickx ( IMEC, Belgium )
- V. Wiaux ( IMEC, Belgium )
- M. Maenhoudt ( IMEC, Belgium )
- M. Goethals ( IMEC, Belgium )
- 掲載資料名:
- Quantum optics, optical data storage, and advanced microlithography : 12-14 November 2007, Beijing, China
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6827
- 発行年:
- 2008
- パート:
- C
- 開始ページ:
- 68271V-1
- 終了ページ:
- 68271V-10
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819470027 [0819470023]
- 言語:
- 英語
- 請求記号:
- P63600/6827
- 資料種別:
- 国際会議録
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