Process investigation of a-Si:H thin films prepared by DC magnetron sputtering

Process investigation of a-Si:H thin films prepared by DC magnetron sputtering

著者名:

C. Liu ( Changchun Univ. of Science and Technology, China )
C. Wang ( Jilin Normal Univ., China )
Y. Yao ( Changchun Univ. of Science and Technology, China )
J. Zhang ( Changchun Univ. of Science and Technology, China )
Z. Qiao ( Changchun Univ. of Science and Technology, China )

掲載資料名:

Lasers in material processing and manufacturing III : 12-14 November 2007, Beijing, China

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6825

発行年:

2008

開始ページ:

682514-1

終了ページ:

682514-8

総ページ数:

8

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819470003 [0819470007]

言語:

英語

請求記号:

P63600/6825

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052456
シリーズID:	PA00000029
会議名:	Photonics Asia : Lasers in Material Processing and Manufacturing
回次:	2007 : 3rd
会議開催地:	Beijing, China
会議開催年:	2007.11.12-2007.11.14
論文注記:	Lasers in material processing and manufacturing III, 12-14 November 2007, Beijing, China - Poster Session (6825-11)

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